Characterizing Properties of Magnetic Films Deposited on Silicon Wafers
نویسنده
چکیده
Silicon samples sputtered with multiple magnetic layers can be characterized by using x-ray diffraction (XRD), vibrating sample magnetometry (VSM), and magneto-optical Kerr effect (MOKE) techniques. XRD identifies the crystallographic structures and chemical composition of the unknown layers. VSM measures the change in magnetic moment versus applied field, thus giving the information needed to find film thickness. MOKE characterizes the many magnetic properties of the sample, including Hp, Hk, and coercivity. Both, VSM and MOKE, are highly sensitive magnetometers and operate easily for electronic machines to date capable of quantifying both intrinsic and surface magnetization properties.
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تاریخ انتشار 2009